Fundamentals and Practice of Process Intensification
Course date: April 20-21, 2016 ; Delft University of Technology
Course director: Prof. A. Stankiewicz (TU Delft)
Guest lecturers: Prof. A. Górak (TU Dortmund)
Dr. T. van Gerven (KU Leuven)
Dr. J. van der Schaaf (TU Eindhoven)
Dr. G. Stefanidis (KU Leuven)
Location: TU Delft
Course language: English
Process intensification (PI) is commonly seen as one of the most promising development paths for the chemical process industry and one of the most important progress areas for modern chemical engineering. The European Roadmap for Process Intensification describes it as “radically innovative principles (‘paradigm shift’) in process and equipment design which can benefit (often with more than a factor two) process and chain efficiency, capital and operating expenses, quality, wastes, process safety and more”. Microreactors, high-gravity equipment or integrated operations are well-known examples of PI-technologies.
The present short course focuses on the fundamentals of Process Intensification. It presents the underlying generic principles and introduces four fundamental approaches of PI in four domains: spatial, thermodynamic, functional, and temporal. The approaches refer to all scales existing in chemical processes, from molecular to meso- and macroscale, and are illustrated with relevant examples. Additional “zoom-in” lectures provide a more in-depth information on selected PI-technologies including microreactors, high-gravity/high-shear reactors, microwave/plasma-assisted reactors, photoreactors as well as reactive and hybrid separations.
On the last day of the course the participants will be given an opportunity to analyze and re-design an existing chemical process using fundamental PI principles and approaches.
PI Approaches – zoom in on PI-technologies